Interface magnetism and superparamagnetism of Co/Cu multilayers

Magnetic Properties and Structural Study of Ni-Co/Cu Multilayers Prepared by Electrodeposition Method

Ni-Co/Cu multilayers have been grown by electrodeposition method from a single electrolyte (based on Ni(SO4).6H2O, Co(SO4).7H2O, Cu(SO4) and H3BO3) using galvanostatic control on titanium sublayers. The X-ray diffraction (XRD) patterns confirmed the multilayered structure with the nanometer thicknesses. Also, electron diffraction x-ray (EDX)  analysis confirmed the purity of deposited samples. ...

Temperature-dependent interface magnetism and magnetization reversal in Co/Pt multilayers

Structure and magnetism of Fe/Si multilayers grown by ion-beam sputtering.

Ion-beam sputtering has been used to prepare Fe/Si multilayers on a variety of substrates and over a wide range of temperatures. Small-angle x-ray diffraction and transmission electron microscopy experiments show that the layers are heavily intermixed although a composition gradient is maintained. When the spacer layer is an amorphous iron silicide, the magnetic properties of the multilayers ar...

Oscillatory Thickness Dependence of Magnetic Moments and Interface - Induced Changes of the Exchange Coupling in Co / Cu and Co - Ni / Cu Multilayers

We perform first-principles calculations for the three multilayer systems (100)-Co 1 /Cu n , NiCo 2 Ni/Cu n and Co 4 Cu n , and find from a comparison of the results for system 2 and 3 that amplitude and phase of the exchange coupling are sensitive to the magnetic-slab/nonmagnetic-spacer interface. Moreover, we observe that for the system 1 the averaged magnetic moment of the magnetic slab osci...

Nanostructural effects and interface magnetism in Co/Pd multilayers

A series of Co/Pd multilayers were made by dc magnetron sputter deposition on Al foil substrates. For these multilayered samples, Co layer thicknesses were less than 4 A and Pd layers were varied from 4 to 22 A. Sputtering rates were controlled by either sputtering power (10-50 W) or Ar sputtering pressure (3-15 mTorr). In both cases, lower deposition rates yielded higher perpendicular coercivi...